Magnetron etching of polysilicon: Electrical damage

• 1 March 1991
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 9  (2) , 366-369
• https://doi.org/10.1116/1.585577

Abstract

Keywords

• MOLECULAR MODELING
• PLASMA ETCHING
• MATHEMATICAL MODEL
• REACTIVE ION ETCHING
• MATERIALS SCIENCE