Optogalvanic effects in the obstructed glow discharge
- 1 February 1983
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 42 (3) , 234-236
- https://doi.org/10.1063/1.93891
Abstract
An anomalously strong 594.5-nm optogalvanic effect is observed in an obstructed glow discharge in 1.0 Torr of Ne occurring between plane parallel Al electrodes separated by 1.0 cm. The absolute size of a steady-state optogalvanic effect is characterized by a dimensionless ratio of the change in power delivered to the load resistor over the absorbed laser power. A ratio of −400 for the 594.5-nm effect is observed in the obstructed glow discharge, while ratios of −6 are typical for the 594.5-nm effect in the positive column discharge. The 594.5-nm effect in the obstructed glow discharge results from a laser induced depletion of metastable atoms which play an important role in electron emission from a cold cathode.Keywords
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