Use of non-Coulomb H ion backscattering to characterize thick anodized aluminum films
- 15 January 1980
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 168 (1-3) , 151-155
- https://doi.org/10.1016/0029-554x(80)91245-8
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Theoretical analysis of the energy spectra of back-scattered ionsThin Solid Films, 1973
- The Use of Rutherford Backscattering to Study the Behavior of Ion-Implanted Atoms During Anodic Oxidation of Aluminum: Ar, Kr, Xe, K, Rb, Cs, Cl, Br, and lJournal of the Electrochemical Society, 1973
- Determination of Surface Impurity Concentration Profiles by Nuclear BackscatteringJournal of Applied Physics, 1971
- Oxygen diffusion in quartz studied by proton bombardmentNuclear Instruments and Methods, 1965