Polymer Resist Systems for Photo- And Electron Lithography

• 1 August 1976
• journal article
• Published by Annual Reviews in Annual Review of Materials Science
• Vol. 6  (1) , 267-301
• https://doi.org/10.1146/annurev.ms.06.080176.001411

Abstract

Keywords

• ELECTRON LITHOGRAPHY
• POLYMER RESIST
• RESIST SYSTEMS
• PHOTO AND ELECTRON
• SYSTEMS FOR PHOTO