The behaviour of Na implanted into Mo thin films during annealing
- 1 June 1999
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 58 (2) , 199-208
- https://doi.org/10.1016/s0927-0248(98)00203-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Substrate influences on CIS device performancePublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- The impact of controlled sodium incorporation on rapid thermal processed Cu(InGa)Se/sub 2/-thin films and devicesPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Influence of substrates on the electrical properties of Cu(In,Ga)Se/sub 2/ thin filmsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Stress, strain, and microstructure of sputter-deposited Mo thin filmsJournal of Applied Physics, 1991
- Properties of reactively sputtered Mo1?x O x filmsApplied Physics A, 1988
- Preparation of amorphous electrochromic tungsten oxide and molybdenum oxide by plasma enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1986