Modelling of rapid thermal processing
- 28 February 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 10 (3-4) , 207-216
- https://doi.org/10.1016/0167-9317(91)90023-7
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Spectral Emissivity of SiliconJapanese Journal of Applied Physics, 1967