Lightly nitrided gate oxides for 0.25 μm CMOS
- 31 August 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 22 (1-4) , 85-88
- https://doi.org/10.1016/0167-9317(93)90136-s
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Nitrogen and oxygen incorporation during rapid thermal processing of Si in N2OApplied Physics Letters, 1992