The non-radiative efficiency in hydrogenated amorphous silicon
- 1 October 1991
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine Letters
- Vol. 64 (4) , 235-240
- https://doi.org/10.1080/09500839108214548
Abstract
The non-radiative efficiencyηnr has been directly measured in hydrogenated amorphous silicon using photo-pyroelectric spectroscopy, for photon energies ranging from 1·5 to 2·2 eV at room temperature. The non-radiative efficiency is fairly constant for above-bandgap illumination, but displays a sharp minimum for photon energies near the bandgap energy.ηnr increases with sub-bandgap illumination, saturating at a value roughly one half as large as its high-energy value.Keywords
This publication has 9 references indexed in Scilit:
- Photopyroelectric spectroscopy ofa-Si:H thin semiconducting films on quartzPhysical Review B, 1989
- Pyroelectric photothermal spectroscopy for thin solid filmsJournal of Applied Physics, 1988
- Pyroelectric calorimeter for photothermal studies of thin films and adsorbatesJournal of Vacuum Science & Technology A, 1987
- Photothermal spectroscopy of weakly absorbing samples using a thermal wave phase shifterApplied Physics Letters, 1984
- Photothermal spectroscopy using a pyroelectric thin-film detectorApplied Physics Letters, 1984
- Photoconductivity of amorphous semiconductorsSolid State Communications, 1981
- Hot-Carrier Thermalization in Amorphous SiliconPhysical Review Letters, 1981
- Photothermal deflection spectroscopy and detectionApplied Optics, 1981
- Photoconductivity, trapping, and recombination in discharge-produced, hydrogenated amorphous siliconPhysical Review B, 1981