New Alicyclic Polymers Based on Protected Dinorbornene Monomers for Application As Deep UV Resists.
- 1 January 1998
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 11 (3) , 499-503
- https://doi.org/10.2494/photopolymer.11.499
Abstract
Japan's largest platform for academic e-journals: J-STAGE is a full text database for reviewed academic papers published by Japanese societiesKeywords
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