Fluorinated amorphous silicon-germanium alloys deposited from disilane-germane mixture
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 1455-1458
- https://doi.org/10.1016/0022-3093(87)90349-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Electron and hole transport in a-Si1−xGex:H alloysJournal of Applied Physics, 1986
- Light-induced effects in amorphous silicon alloys - Design of solar cells with improved stabilityJournal of Non-Crystalline Solids, 1985
- Preferential Attachment of H in Amorphous Hydrogenated Binary Semiconductors and Consequent Inferior Reduction of Pseudogap State DensityPhysical Review Letters, 1981