Characterisation of a new batch of ion implanted Bi in silicon specimens for use as primary reference surface standards
- 1 December 1983
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 218 (1-3) , 91-96
- https://doi.org/10.1016/0167-5087(83)90960-2
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- A gold and aluminium implanted standard for ion beam experimentsNuclear Instruments and Methods, 1980
- How accurate are absolute rutherford backscattering yieldsNuclear Instruments and Methods, 1979
- Standards for backscattering analysisNuclear Instruments and Methods, 1978