Thickness dependence of the dielectric behavior of SiO2 films fabricated by microwave electron cyclotron resonance plasmas
- 1 January 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 9 (1) , 50-57
- https://doi.org/10.1116/1.585789
Abstract
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