Photoluminescence study of defects in Si+ ion implanted thermal SiO2 films
- 1 April 1998
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 83 (7) , 3609-3613
- https://doi.org/10.1063/1.366578
Abstract
No abstract availableThis publication has 24 references indexed in Scilit:
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