Characterization of High Surface Area Silicon Oxynitrides
- 1 January 1992
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
High surface area silicon oxynitrides have been prepared by nitrida- tion of silica with ammonia. Characterization by Fourier-transform infrared spectroscopy has allowed quantitative determination of hydroxyl, amido and imido groups. Data obtained by X-ray photoelectron spectroscopy show that the nitrogen is well distributed in the surface of the materials.Keywords
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