Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target
- 30 January 1999
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 56 (3-4) , 259-269
- https://doi.org/10.1016/s0927-0248(98)00136-6
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Electrochromism in Sputtered WO 3 Thin FilmsJournal of the Electrochemical Society, 1996
- Observation of non-ideal lithium insertion into sputtered thin films of tungsten oxideThin Solid Films, 1994
- Optical switching technology for glazingsThin Solid Films, 1993
- The influence of microstructure on the electrochromic properties of LixWO3 thin films: Part I. Ion diffusion and electrochromic propertiesJournal of Materials Research, 1993
- Infrared absorption of colored and bleached films of tungsten oxideSolid State Ionics, 1990
- Electrochemical Properties of WO 3 · x ( H 2 O ) : I . The Influences of Water Adsorption and HydroxylationJournal of the Electrochemical Society, 1983
- Thermalization of sputtered atomsJournal of Applied Physics, 1981
- Principles and operation of an all solid state electrochromic display based on a-“WO3”Thin Solid Films, 1980
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977
- Optical and photoelectric properties and colour centres in thin films of tungsten oxidePhilosophical Magazine, 1973