Magnetic properties of thin films prepared by continuous vapor deposition
- 1 November 1982
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 18 (6) , 1077-1079
- https://doi.org/10.1109/tmag.1982.1062143
Abstract
Magnetic thin films deposited by the oblique incidence evaporation are considered to have excellent characteristics for high density recording medium. The magnetic properties and microstructures of these films prepared continuously with a roll coater have been investigated. In continuous vapor deposition, two different modes of deposition processes are considered, corresponding to substrate running direction. The HIN (high incidence nucleation) direction implies that deposition initiates at higher incidence angle and shifts to lower incidence angle. The LIN (low incidence nucleation) direction is the opposite. Hc and Ir/Is of the films by HIN direction have larger values than those by LIN direction in the same region of incidence angle. According to TEM micrographs of thin films by HIN direction, it is observed that elongated nucleation is taken place in higher incidence angle direction and subsequently grown in same direction.Keywords
This publication has 2 references indexed in Scilit:
- Hard Magnetic Films of Iron, Cobalt, and NickelJournal of Applied Physics, 1965
- Coercive Force of Angle of Incidence FilmsJournal of Applied Physics, 1964