High capacity sputtering apparatus for hybrid microwave integrated circuits production
- 1 November 1974
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 24 (1) , 113-124
- https://doi.org/10.1016/0040-6090(74)90256-9
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Temperature coefficient of resistance of beta-tantalum films and mixtures with b.c.c.-tantalumThin Solid Films, 1972
- The use of sputtered conductor materials in film integrated circuitsThin Solid Films, 1972