Optical waveguides with apodized sidewall gratings via spatial-phase-locked electron-beam lithography
- 1 November 2002
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 20 (6) , 2753-2757
- https://doi.org/10.1116/1.1521744
Abstract
We describe a technique to fabricateBragg gratings in the sides of optical waveguides using a single lithographic step. This technique is particularly suited to the apodized gratings required for add/drop filters in dense-wavelength-division multiplexing.Apodization minimizes cross talk between channels and improves the filter response. Silicon-on-insulator rib waveguides with both uniform and apodized gratings were fabricated using direct-write spatial-phase-locked electron-beam lithography (SPLEBL). This approach combines SPLEBL’s pattern-placement accuracy with the flexibility of direct-write device prototyping. The resulting grating-based devices exhibited substantially reduced side-lobe levels.Keywords
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