Preparation of SiO2 films with embedded Si nanocrystals by reactive r.f. magnetron sputtering
- 1 September 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 330 (2) , 202-205
- https://doi.org/10.1016/s0040-6090(98)00609-9
Abstract
No abstract availableKeywords
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