Structure and dielectric properties of amorphous LiNbO3 thin films prepared by a sputtering deposition
- 15 September 1984
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 56 (6) , 1780-1784
- https://doi.org/10.1063/1.334185
Abstract
Thin films of amorphous LiNbO3 were prepared by a sputtering deposition technique. Their structure and dielectric properties were studied. The as‐sputtered amorphous LiNbO3 exhibited a dielectric anomaly close to the crystallization temperature. The dielectric anomaly was explained by the dielectric relaxation and the change in microscopic structure. The high dielectric constant and the dielectric relaxation were attributed to the Li ion transfer to the adjacent O‐octahedron unit in the micronetwork which is similar to the crystalline LiNbO3.This publication has 10 references indexed in Scilit:
- Structure and electrical properties of amorphous PbTiO3 thin films sputtered on cooled substratesJournal of Non-Crystalline Solids, 1982
- High Dielectric Constant Films of Amorphous LiNbO3 Prepared by Sputtering DepositionJapanese Journal of Applied Physics, 1981
- Dielectric Constant of Amorphous PbTiO3Japanese Journal of Applied Physics, 1980
- Crystallization Process from Amorphous PbTiO3Japanese Journal of Applied Physics, 1980
- Quenched Metastable Glassy and Crystalline Phases in the System Lithium‐Sodium‐Potassium Metaniobate‐TantalateJournal of the American Ceramic Society, 1979
- Amorphous Ribbons of LiNbO3, PbTiO3and (PbTiO3)0.9(B2O3)0.1Japanese Journal of Applied Physics, 1979
- Ionic conductivity of quenched alkali niobate and tantalate glassesJournal of Applied Physics, 1978
- Anomalous dielectric behavior and reversible pyroelectricity in roller-quenched LiNbO3 and LiTaO3 glassApplied Physics Letters, 1977
- Ferroelectric lithium niobate. 3. Single crystal X-ray diffraction study at 24°CJournal of Physics and Chemistry of Solids, 1966
- Energy Distribution of Sputtered Cu AtomsJournal of Applied Physics, 1964