o-Nitrophenylethylene Glycol: a Photosensitive Protecting Group for Aldehydes and Ketones

Abstract
O-Nitrophenylethylene glycol (1) was synthesized and found to be useful as a photochemically labile blocking group for aldehydes and ketones. The acetals obtained are cleaved smoothly upon irradiation at 3500 Å, regenerating the parent carbonyl compound in very good yield.

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