Rare gas-oxygen effects on the rf sputter deposition of platinum
- 1 October 1983
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 54 (10) , 6051-6052
- https://doi.org/10.1063/1.331752
Abstract
Thin Pt films were sputter deposited on Si substrates using Ar and Ne rf glow discharges containing 0%–6% O2. Significant differences in electrical resistivity, crystallography, and Pt suboxide formation were found to depend upon the type of rare gas used for a given nominal O2 partial pressure. Several reasons for this behavior are proposed.This publication has 7 references indexed in Scilit:
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