Dark Field Technology - A Practical Approach To Local Alignment

1 January 1987

conference paper
Published by SPIE-Intl Soc Optical Eng

Vol. 772, 142-151
https://doi.org/10.1117/12.967043

Abstract

A fully automated direct reticle reference alignment system for use in step and repeat camera systems is described. The technique, first outlined by Janus S. Wilczynski, ("Optical Step and Repeat Camera with Dark Field Alignment", J. Vac. Technol., 16(6), Nov./Dec. 1979), has been implemented on GCA Corporation's DSW Wafer Stepper®. Results from various process levels covering the typical CMOS process have shown that better than ±0.2μm alignment accuracy can be obtained with minimal process sensitivity. The technique employs fixed illumination and microscope optics to achieve excellent registration stability and maintenance-free operation. Latent image techniques can be exploited for intra-field, grid and focus characterization.© (1987) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

Keywords

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