Surface modelling of reactive ion etching of silicon–germanium alloys in a SF6 plasma
- 31 December 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 97 (1-3) , 465-468
- https://doi.org/10.1016/s0257-8972(97)00221-1
Abstract
No abstract availableKeywords
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