Reaction of silicon with films of CoNi alloys: Phase separation of the monosilicides and nucleation of the disilicides
- 1 June 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 128 (1-2) , 107-124
- https://doi.org/10.1016/0040-6090(85)90339-6
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- A note on solid-state reaction kinetics: The formation of silicides from thin films of metallic alloysJournal of Applied Physics, 1985
- Phase separation and layer sequence reversal during silicide formation with Ni-Cr alloys and Ni-Cr bilayersJournal of Applied Physics, 1984
- Effects of Ion Implantation on the Thermal Growth of Pt and NiPt SilicidesJournal of the Electrochemical Society, 1983
- The interaction of Ni-Pt alloy with siliconThin Solid Films, 1982
- Interaction of evaporated palladium and titanium films with single-crystal siliconThin Solid Films, 1980
- An interface — marker technique applied to the study of metal silicide growthNuclear Instruments and Methods, 1980
- Silicide formation with Pd-V alloys and bilayersJournal of Applied Physics, 1979
- Silicide formation with nickel and platinum double layers on siliconThin Solid Films, 1978
- Radioactive silicon tracer studies of the formation of CrSi2on Pd2Si and PtSiPhilosophical Magazine A, 1978
- Composition profiles and Schottky barrier heights of silicides formed in NiPt alloy filmsJournal of Applied Physics, 1976