An expanding thermal plasma for deposition of surface textured ZnO:Al with focus on thin film solar cell applications
- 1 March 2001
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 173 (1-2) , 40-43
- https://doi.org/10.1016/s0169-4332(00)00875-8
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Textured ZnO Thin Films for Solar Cells Grown by a Two-step Process with the Atomic Layer Deposition TechniqueJapanese Journal of Applied Physics, 1998
- The expanding thermal arc plasma: the low-flow regimePlasma Sources Science and Technology, 1998
- Device Modeling of a-Si:H Alloy Solar Cells: Calibration Procedure for Determination of Model Input ParametersMRS Proceedings, 1998
- Solution of the ZnO/p contact problem in a-Si:H solar cellsSolar Energy Materials and Solar Cells, 1996
- Improvement in stabilized efficiency of a-Si:H solar cells through optimized p/i-interface layersSolar Energy Materials and Solar Cells, 1996
- The Growth of Surface Textured Aluminum Doped ZnO Films for a-Si Solar Cells by RF Magnetron Sputtering At Low TemperatureMRS Proceedings, 1996
- Technological Development for Commercialization of Amorphous Silicon Based Multijunction ModulesMRS Proceedings, 1996
- Textured ZnO Thin Films for Solar Cells Grown by Metalorganic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1991
- Indium-doped zinc oxide films as transparent electrodes for solar cellsSolar Energy Materials, 1988
- Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1985