Using Self-Assembled Monolayers Exposed to X-rays To Control the Wetting Behavior of Thin Films of Diblock Copolymers
- 7 April 2000
- journal article
- research article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 16 (10) , 4625-4631
- https://doi.org/10.1021/la991500c
Abstract
No abstract availableKeywords
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