Chloromethylated Polystyrene as a Dry Etching‐Resistant Negative Resist for Submicron Technology
- 1 September 1979
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 126 (9) , 1628-1630
- https://doi.org/10.1149/1.2129344
Abstract
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