Optimal developer selection for negative acting resists
- 1 September 1986
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 26 (16) , 1158-1164
- https://doi.org/10.1002/pen.760261617
Abstract
No abstract availableKeywords
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- Preparation of x-ray lithography masks with 0.1 μm structuresJournal of Vacuum Science and Technology, 1979
- Velocity of dissolution of polymers. Part IIJournal of Polymer Science, 1962
- Velocity of dissolution of polymers. Part IJournal of Polymer Science, 1962