A 0.5 mu m CMOS/SOI technology

• 9 December 2002
• proceedings article
• Published by Institute of Electrical and Electronics Engineers (IEEE)
• p. 130-131
• https://doi.org/10.1109/soi.1991.162891

Abstract

Keywords

• TECHNOLOGY
• SUBSTRATE
• FET
• DOPED
• FULLY DEPLETED
• SIMOX
• CMOS/SOI