On the analysis of an ECR plasma
- 1 September 1990
- journal article
- Published by Elsevier in Physics Letters A
- Vol. 149 (2-3) , 159-161
- https://doi.org/10.1016/0375-9601(90)90544-x
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Magnetic field gradient effects on ion energy for electron cyclotron resonance microwave plasma streamJournal of Vacuum Science & Technology A, 1988
- Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance PlasmaJapanese Journal of Applied Physics, 1983
- Microwave Plasma EtchingJapanese Journal of Applied Physics, 1977