Low-temperature deposition of diamond in a temperature range from 70 °C to 700 °C
- 25 March 1992
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 1 (2-4) , 187-190
- https://doi.org/10.1016/0925-9635(92)90022-g
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Low-temperature deposition of diamond films for optical coatingsApplied Physics Letters, 1989
- Low-temperature diamond deposition by microwave plasma-enhanced chemical vapor depositionApplied Physics Letters, 1989
- Diamond synthesis from gas phase in microwave plasmaJournal of Crystal Growth, 1983
- Vapor Deposition of Diamond Particles from MethaneJapanese Journal of Applied Physics, 1982