Plasma assisted CVD of TiS2
- 1 July 1989
- journal article
- solid state-ionics
- Published by Springer Nature in Applied Physics A
- Vol. 49 (1) , 105-109
- https://doi.org/10.1007/bf00615472
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Fundamental aspects of the electronic structure, materials properties and lubrication performance of sputtered MoS2 filmsThin Solid Films, 1987
- A neglected parameter (water contamination) in sputtering of MoS2 filmsThin Solid Films, 1986
- Titanium disulfide films fabricated by plasma CVDSolid State Ionics, 1986
- Chemical diffusivity of lithium in LiyTi1+xS2Solid State Ionics, 1985
- Effect of Nonstoichiometry and Solvent on Discharge Property of Li / TiS2 BatteryJournal of the Electrochemical Society, 1984
- Plasma-Enhanced Chemical Vapor Deposition of Thin FilmsPublished by Elsevier ,1982
- Formation of stoichiometric titanium disulfideMaterials Research Bulletin, 1981
- Chemical Vapor Deposition of Titanium DisulfideBulletin of the Chemical Society of Japan, 1978
- Chemistry of intercalation compounds: Metal guests in chalcogenide hostsProgress in Solid State Chemistry, 1978
- Herstellung und charakterisierung von ultrafeinen Karbiden, Nitriden und MetallenJournal of the Less Common Metals, 1966