RHEA (resist-hardened etch and anodization) process for fine-geometry Josephson junction fabrication
- 1 March 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 27 (2) , 3133-3136
- https://doi.org/10.1109/20.133875
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- A 1 µm Cross-Line Junction ProcessPublished by Springer Nature ,1986
- High Temperature Flow Resistance of Micron Sized Images in AZ ResistsJournal of the Electrochemical Society, 1981
- Selective niobium anodization process for fabricating Josephson tunnel junctionsApplied Physics Letters, 1981
- Sealed-interface local oxidation technologyPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1981