Nano-resolution tri-level process by downstream- microwave rf-biased etching
- 31 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 17 (1-4) , 349-352
- https://doi.org/10.1016/0167-9317(92)90072-y
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- SIMS and AES investigations of contamination effects by RIE of PIQ layersMicroelectronic Engineering, 1985