Low Pressure Chemical Vapor Deposition of Si1 − x Ge x Films on SiO2 : Characterization and Modeling
- 1 May 1995
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 142 (5) , 1566-1572
- https://doi.org/10.1149/1.2048614