Organic insulating films of nanometer thicknesses
- 9 September 1996
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 69 (11) , 1646-1648
- https://doi.org/10.1063/1.117444
Abstract
It is demonstrated that monolayers of organic molecules (long chain hydrocarbons) as thin as 1.9 nm, deposited by the self‐assembly technique on silicon, form high performance electrically insulating barriers. Their properties are compared with those of silicon dioxide. Leakage current densities through the organic monolayers of the order of 10−8–10−7A/cm2 have been obtained. These values are 4–5 decades lower than those for silicon dioxide of equivalent thickness. Larger tunneling barriers for organic monolayers than for silicon dioxide explain these results.Keywords
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