A ferroelectric DRAM cell for high density NVRAMs
- 1 January 1990
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- An experimental 512-bit nonvolatile memory with ferroelectric storage cellIEEE Journal of Solid-State Circuits, 1988
- Yttrium oxide/silicon dioxide: a new dielectric structure for VLSI/ULSI circuitsIEEE Electron Device Letters, 1988
- Thin-film ferroelectrics of PZT of sol-gel processingIEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, 1988