An investigation of phase formation by high dose silicon ion implantation into nickel
- 1 June 1993
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 80-81, 352-356
- https://doi.org/10.1016/0168-583x(93)96140-8
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Temperature dependence of the amorphization of NiTi irradiated with Ni ionsJournal of Materials Research, 1990
- Ion beam modification of metalsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1990
- Transmission electron microscopy study of amorphization and precipitation in Ni+-implanted aluminiumMaterials Science and Engineering: A, 1989
- Temperature dependence of amorphization and precipitation processes in Ni+- and N+-implanted NixTi1−x alloysMaterials Science and Engineering: A, 1989
- NiSi2 precipitation in nickel-implanted silicon filmsApplied Physics Letters, 1987
- Ion-induced phase formation in metal-metal and metal-silicon thin film structuresNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Transformation to amorphous state of metals by ion implantation: P in NiPhysical Review B, 1985
- Metallic glass formation by ion implantation into nickelVacuum, 1984
- Review of binary alloy formation by thin film interactionsJournal of Vacuum Science and Technology, 1979
- Phase diagrams and metal-rich silicide formationJournal of Applied Physics, 1979