Relationship between Plasma Parameters and Carbon Atom Coordination in a-C:H Films Prepared by RF Glow Discharge Decomposition

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Abstract
Amorphous C:H films were prepared by rf glow discharge decomposition from CH4 using a permanent magnet system to apply a static magnetic field perpendicular to the rf electric field. The structure and properties of a-C:H films have been investigated systematically with respect to the hydrogen content, hardness and coordination of carbon atoms as a function of rf power (self-bias voltage). The coordination of carbon atoms has been determined by solid-state 13C magic angle spinning nuclear magnetic resonance measurements. It is found that the fraction of graphitic (sp2) versus tetrahedral (sp3) bonding increases with increasing rf power (negative self-bias voltage). Film hardness is understood in terms of the balance between the incorporated hydrogen and the fraction of graphitic (sp2) versus tetrahedral (sp3) bonding. The production of ionic and neutral species from a glow discharge has also been monitored by mass spectroscopy and optical emission spectroscopy to investigate the relation between plasma parameters and carbon atom coordination. Using these measurements and negative self-bias measurements, it is shown that the coordination of carbon atoms is determined not only by the energy of impinging ions on the substrate but also by the type of active species. In addition, the neutral and ionic C2H2 related species are thought to be some of the species which increase the fraction of graphitic (sp2) versus tetrahedral (sp3) bonding.

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