Novel, Organic Acid‐Based Etchants for InGaAlAs / InP Heterostructure Devices with AlAs Etch‐Stop Layers
- 1 August 1992
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 139 (8) , 2306-2309
- https://doi.org/10.1149/1.2221220