Electron Beam Lithography For Maskmaking

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Abstract
At this point in time, some thirteen companle-73 have manufacturing electron beam exposure systems. In view of that fact, I feel it is time that the current practical realities of e-beam be presented to the rest of the industry. It is the purpose of this talk to present those realities and make some projections for the future. Capabilities for defect density, critical dimension uniformity, overlay registration and other mask related parameters will be discussed and quantified. Manufacturing considerations from design to the finished mask will be examined.

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