Epoxide-Containing Polymers as Highly Sensitive Electron-Beam Resists

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Abstract
High sensitivities to electron beams have been found in epoxide‐containing polymers such as epoxidized polybutadiene, epoxidized polyisoprene, and poly(glycidyl methacrylate). The sensitivities of these polymers to electron beams are 50–300 times higher than those of the commercial photoresist KTFR. Epoxidized polybutadiene, with the highest sensitivity, becomes insoluble upon an electron beam exposure of at an accelerating voltage of 15 kV; the G value for crosslinking was calculated to be about 200. These polymers can be used as resists for the etching of chromium and aluminum, as well as of oxide layers formed on silicon wafers.

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