Mechanical stress considerations in thin-film devices
- 30 April 1963
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 6 (2) , 159-161
- https://doi.org/10.1016/0038-1101(63)90010-8
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Stress Anisotropy in Silicon Oxide FilmsJournal of Applied Physics, 1963
- Apparatus for the Measurement of Stress in Vacuum Evaporated FilmsReview of Scientific Instruments, 1961