Infrared Reflection Absorption Spectroscopy of Photoresist Films on Silicon Wafers: Measuring Film Thickness and Removing Interference Fringes
- 1 April 1994
- journal article
- Published by American Chemical Society (ACS) in Analytical Chemistry
- Vol. 66 (7) , 1015-1020
- https://doi.org/10.1021/ac00079a015
Abstract
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