Highly sensitive positive deep UV resist utilizing a sulfonate acid generator and a tetrahydropyranyl inhibitor
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 33-36
- https://doi.org/10.1016/0167-9317(91)90042-c
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Acid formation and deprotection reaction by novel sulfonates in a chemical amplification positive photoresistChemistry of Materials, 1990
- Chemical amplification in the design of dry developing resist materialsPolymer Engineering & Science, 1983
- Synthese eines 1‐Oxa‐phenalen‐Derivates mit dem chromophoren System des BiflorinsHelvetica Chimica Acta, 1963