Spin tunneling magnetoresistance in NiFe/Al2O3/Co junctions with reduced dimensions formed using photolithography
- 1 February 1997
- journal article
- Published by Elsevier in Journal of Magnetism and Magnetic Materials
- Vol. 166 (1-2) , 71-74
- https://doi.org/10.1016/s0304-8853(96)00441-6
Abstract
No abstract availableKeywords
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