Spin-on sources for boron and arsenic diffusion

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Abstract
‘Spin-on’ sources are commercially available either under brand names like ‘Accuspin’ or doped silicate films manufactured by various companies. However, the method of preparation of these doping solutions is not known and since almost all these solutions become jelly after a certain duration during which the viscosity changes, it is preferable to prepare one's own solution so that one can easily control the solution composition to a particular requirement and achieve reproducibility. In this paper, we report easy-to-prepare ‘spin-on’ solutions for boron and arsenic which give highly reproducible surface concentrations very close to the solid solubility limit. These solutions are useful for deep junction formation in silicon.

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