D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin‐Dioxide Thin‐Films
Open Access
- 1 January 1980
- journal article
- research article
- Published by Wiley in Active and Passive Electronic Components
- Vol. 7 (1-3) , 19-22
- https://doi.org/10.1155/apec.7.19
Abstract
This paper discusses the problems involved in obtaining reliable and reproducible thin films of Sb-doped SnO2 films by the d.c. sputtering process. An attempt to characterize the process is made by correlating the deposition parameters with the factors that contribute to the conductivity of the SnO2 films. The areas of concern are identified, and guidelines are offered for making the process and the film properties controllable.Keywords
This publication has 0 references indexed in Scilit: