Reactions of laser-generated free radicals in silicon deposition processes
- 31 December 1990
- journal article
- Published by Elsevier in Spectrochimica Acta Part A: Molecular Spectroscopy
- Vol. 46 (4) , 589-596
- https://doi.org/10.1016/0584-8539(90)80175-x
Abstract
No abstract availableThis publication has 42 references indexed in Scilit:
- Infrared double-resonance lineshapes in strongly pumped spherical-top moleculesSpectrochimica Acta Part A: Molecular Spectroscopy, 1989
- Multiple pathways for the direct formation of SiH2from the photodissociation of ethylsilaneMolecular Physics, 1989
- Information theoretic analysis of quantal fluctuations in fluorescence lifetimesThe Journal of Physical Chemistry, 1988
- The decomposition of alkyl silanes (SiMenH4−n, 0≤n≤4) on Ni(100)Journal of Vacuum Science & Technology A, 1988
- Reactions of organosilanes initiated by infrared multiple photon excitationSpectrochimica Acta Part A: Molecular Spectroscopy, 1987
- Mechanistic Studies of Chemical Vapor DepositionAnnual Review of Physical Chemistry, 1987
- Theoretical Studies of Silicon ChemistryAnnual Review of Physical Chemistry, 1987
- Infrared photochemistry of alkyl- and arylsilanesThe Journal of Physical Chemistry, 1984
- Kinetics of the high-temperature thermal decomposition of silanes and alkylsilanesOrganometallics, 1983
- Laser Microchemistry and its Application to Electron-Device FabricationAnnual Review of Physical Chemistry, 1983